Glow-Discharge Hydrogenated Amorphous Silicon

ISBN-13: 9780792303091 / Angielski / Twarda / 1989 / 277 str.

K. Tanaka; K. Tanaka

Opis

A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin